等离子化体化学

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低压化学汽相淀积在110取向等离子体增强化学汽相淀积多晶硅膜上的非晶硅膜	LPCVD a-Si film deposited onto a 110-oriented PECVD poly-Si film
低能等离子体增强化学汽相淀积	low energy plasma-enhanced chemical vapor deposition
分布式电子回旋共振等离子体增强化学汽相淀积	distributed electron cyclotron resonance plasma enhanced chemical vapor deposition
单模等离子体激活化学汽相淀积	single-mode plasma-activated chemical vapor deposition
原硅酸四乙酯臭氧脉冲波等离子体增强化学汽相淀积	TEOS ozone pulse-wave plasma enhanced chemical vapor deposition
原硅酸四乙酯臭氧脉冲调制等离子体增强化学汽相淀积	TEOS ozone pulse modulated plasma enhanced chemical vapor deposition
反应等离子体化学汽相淀积	reactive plasma chemical vapor deposition
反应等离子体增强化学汽相淀积	reactive plasma enhanced chemical vapor deposition
国际等离子体化学研讨会	International Symposium on Plasma Chemistry
多孔管等离子体化学汽相淀积	porous tube plasma chemical vapor deposition
多极等离子体增强化学汽相淀积	multipolar plasma enhanced chemical vapor deposition
室温等离子体化学汽相淀积	room temperature plasma chemical vapor deposition
射频等离子体化学汽相淀积	radio frequency plasma chemical vapor deposition
射频等离子体增强化学汽相淀积	radio frequency plasma enhanced chemical vapor deposition
射频等离子体激活化学汽相淀积	radio frequency plasma activated chemical vapor deposition
微波等离子体化学汽相淀积	microwave plasma chemical vapor deposition
微波等离子体增强化学汽相淀积	microwave plasma enhanced chemical vapor deposition
微波等离子体辅助化学汽相淀积	microwave plasma-assisted chemical vapor deposition
快速加热等离子体增强化学汽相淀积	rapid thermal plasma-enhanced chemical vapor deposition
感应耦合等离子体化学汽相淀积	inductively coupled plasma chemical vapor deposition
渐变折射率等离子体激活化学汽相淀积	gradual-index plasma-activated chemical vapor deposition
溅射辅助等离子体化学汽相淀积	sputter-assisted plasma chemical vapor deposition
热壁型对称等离子体化学汽相淀积	hot-wall type symmetric-plasma chemical vapor deposition
电子回旋共振微波等离子体化学汽相淀积	electron cyclotron resonance microwave plasma chemical vapor deposition
电子回旋共振等离子体化学汽相淀积	electron cyclotron resonance plasma chemical vapor deposition
电子回旋共振等离子体增强化学汽相淀积	electron cyclotron resonance plasma-enhanced chemical vapor deposition
电子回旋共振等离子体增强金属有机物化学汽相淀积	electron cyclotron resonance plasma-enhanced metalorganic chemical vapor deposition
等离子体化学汽相淀积	plasma chemical vapor deposition
等离子体化学汽相淀积氧化硅	plasma chemical vapor deposited silicon oxide (SiO 或 SiO₂)
等离子体化学汽相淀积氮化硅	plasma chemical vapor deposited silicon nitride
等离子体化学监测仪	plasma chemistry monitor
等离子体增强低压化学汽相淀积	plasma-enhanced low-pressure chemical vapor deposition
等离子体增强化学汽相淀积	plasma enhanced chemical vapor deposition
等离子体增强化学汽相淀积	plasma-enhanced chemical vapor deposition
等离子体增强化学汽相淀积原硅酸四乙脂	plasma-enhanced chemical vapor deposited tetraethylorthosilicate
等离子体增强化学汽相淀积氮化硅	plasma-enhanced chemical vapor deposited silicon nitride
等离子体增强改良化学汽相淀积	plasma-enhanced modified chemical vapor deposition
等离子体增强金属有机物化学汽相淀积	. plasma-enhanced metal-organic chemical vapor deposition
等离子体激励化学汽相淀积	plasma promoted chemical vapor deposition
等离子体激活化学汽相淀积	plasma-activated chemical vapor deposition
等离子体激活化学汽相淀积	plasma activated chemical vapor deposition
等离子体诱发化学汽相淀积	plasma induced chemical vapor deposition
等离子体诱发化学汽相淀积	plasma impulsed chemical vapor deposition
等离子体辅助化学汽相淀积	plasma-assisted chemical vapor deposition
等离子体辅助化学蚀刻	plasma assisted chemical etching
脉冲等离子体化学汽相淀积	pulsing plasma chemical vapor deposition
遥控等离子体增强化学汽相淀积	remote plasma enhanced chemical vapor deposition
遥控等离子体增强化学汽相淀积	remote plasma-enhanced chemical vapor deposition
遥控等离子体增强超高真空化学汽相淀积	remote plasma enhanced ultrahigh vacuum chemical vapor deposition
遥控等离子体金属有机物化学汽相淀积	remote plasma metal-organic chemical vapor deposition
面等离子体化学汽相淀积	surface plasma chemical vapor deposition
高密度等离子体化学汽相淀积	high-density plasma chemical vapor deposition

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