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Terms for subject Electronics containing 反等离子体 | all forms
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共振诱导等离子体蚀刻反应器resonant inductive plasma etcher reactor
反应等离子体化学汽相淀积reactive plasma chemical vapor deposition
反应等离子体增强化学汽相淀积reactive plasma enhanced chemical vapor deposition
反应脉冲等离子体reactive pulse plasma
圆盘式微波等离子体反应器microwave plasma disk reactor
多圆片等离子体反应器multiwafer plasma reactor
电子回旋共振贴近式等离子体反应加工系统electron cyclotron resonance close proximity plasma processing system
磁约束等离子体反应离子蚀刻magnetically confined plasma reactive ion etching
等离子体反应溅射淀积plasma reactive sputtering deposition
等离子体增强反应离子蚀刻plasma-enhanced reactive ion etching
等离子体引发聚合反应plasma-initiated polymerization
贴近式等离子体反应加工系统close proximity plasma processing system
隔板约束等离子体反应离子蚀刻flap shield confined plasma reactive ion etching
高密度等离子体反应器high-density plasma reactor