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Electronics
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LPCVD a-Si film deposited
onto
a fused quartz substrate
低压化学汽相淀积在熔凝石英衬底上的非晶硅膜
LPCVD a-Si film deposited
onto
a
110
-oriented PECVD poly-Si film
低压化学汽相淀积在
110
取向等离子体增强化学汽相淀积多晶硅膜上的非晶硅膜
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